Compatible with a majority of lasers for processing a wide variety of materials and products.
CO2: 9.2 - 10.6 µm
|Typical Marking Speed3
|Long Term Drift4||
Offset: <100 µrad
Offset: <20 µrad/°C
|Modular or Enclosed||
All angles are in optical degrees, unless otherwise noted.
1. Supports HeNe laser band.
Marking & Coding
Fast Character Marking Performance
Use MOVIA when coding applications which require high throughput; the short step response and tune design are optimized for short vectors like in character marking.
Uniform Line Spacing
Achieving uniform line spacing through bi-directional hatching increases throughput by up to 50%, compared to uni-directional hatching. The precise line spacing ensures uniform laser power density on the surface and evenly “fill” shapes like logos or graphics.
Easy System Integration
MOVIA’s small system design enables a reduced system footprint for easy integration. Its industry standard interface and input options enable easy replacement option as well as a flexible system integration.
Improved Marking Throughput with ScanMaster Controller
Users can achieve improved marking throughput with variable poly delay enabled through our ScanMaster Controller, resulting in significant impact in jobs which have corners, arcs and circles. The typical CPS performance is about 50% higher.
Complete Your Laser Marking System with CO2 Lasers
Novanta offers high performance, precision tuned components and sub-systems, tested to meet your specific needs. MOVIA is compatible with Synrad’s CO2 lasers offering a wide selection of lasers with multiple configuration options to ensure maximum marking and coding flexibility.